By J Hu
Desktop know-how has remodeled textiles from their layout via to their manufacture. This booklet displays the numerous advances which have been made in machine applied sciences, protecting a variety of issues from modeling to digital textiles and clothing. half 1 offers a overview of alternative computing device dependent applied sciences appropriate for fabric fabrics. Chapters contain desktop know-how for yarn constitution, textile defects and garment constitution. half 2 discusses modeling and simulation rules of fibers and textiles. Examples of issues comprise the modeling of yarn and clothes. half three concludes with a evaluation of machine dependent applied sciences particular to clothing, issues diversity from 3D physique scanning to digital textiles.
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Additional info for Computer Technology for Textiles and Apparel (Woodhead Publishing Series in Textiles)
Only a dual-sided view of a fabric could illustrate the complete information and show the yarn interlacing from one side to the other side as illustrated in Fig. 3. The systematic framework of dual-side scanning and the AGM system is demonstrated in Fig. 4.
7). 8. 9. 1 A generic diagram of digitalized yarn feature analysis. 2 Measurement of yarn evenness Consistent yarn thickness is essential for the high quality of textile products. For many years, yarn irregularity has been measured by the capacitance evenness tester using two parallel capacitive sensors. The capacitance based method is accurate and stable in yarn mass measurement and has been well accepted in the textile industry for decades. Nevertheless this method can only give a rough description of yarn irregularity in diameter.
The top and bottom plates in (2) are joined by a hinge, and on each plate there is a sample window on the four corners at which four reference points, with a predefined geometrical positioning relationship, are located. 1 Dual-side imaging system. 2 Dual-side images of a fabric after alignment (left: upper-side view; right: bottom-side view), and the merged image of dual-side images (center). locate the mirrored yarn sections between the top and bottom images of the woven fabric. The principle of dual-side imaging and matching relies on the alignment of the top image and the bottom image to locate the mirrored yarn sections between them, as illustrated in Fig.
Computer Technology for Textiles and Apparel (Woodhead Publishing Series in Textiles) by J Hu